Перегляд за автором "Kondratenko, V.V."

Сортувати за: Порядок: Результатів:

  • Application of carbon as a barrier layer in Sc/Si multilayer X-ray mirrors 
    Pershyn, Yu.P.; Devizenko, I.Yu.; Chumak, V.S.; Devizenko, A.Yu.; Kondratenko, V.V. (Functional Materials, 2018)
    X-ray reflectometry in the hard X-ray region (λ = 0.154 nm) was used to investigate the barrier properties of carbon layers 0.2-1.3 nm thick in Sc/Si multilayer X-ray mirrors (MXMs) deposited by DC magnetron sputtering. ...
  • Behavior of the Ti-Zr-Ni thin film containing quasicrystalline and approximant phases under radiative-thermal action in transition modes 
    Malykhin, S.V.; Makhlai, V.A.; Surovitskiy, S.V.; Garkusha, I.E.; Herashchenko, S.S.; Kondratenko, V.V.; Kopylets, I.A.; Zubarev, E.N.; Borisova, S.S.; Fedchenko, A.V. (Вопросы атомной науки и техники, 2020)
    X-ray diffraction and SEM microscopy were used to study the structural and phase changes in a thin film obtained by magnetron sputtering of a Ti52Zr30Ni18 target (at.%) on a steel substrate under the radiation-thermal ...
  • Formation and evolution of intermixing zones in C/Si multilayer under heating 
    Zhuravel, I.A.; Bugayev, Ye.A.; Penkov, A.V.; Zubarev, E.N.; Sevryukova, V.A.; Kondratenko, V.V. (Functional Materials, 2014)
    Formation of intermixing zones, their structure and phase composition in C/Si multilayers in as-deposited state and after annealing are studied. During deposition intermixing zones of ∼ 0.6 m thick are formed at both ...
  • Growth and structure of WC/Si multilayer x-ray mirror 
    Pershyn, Y.P.; Chumak, V.S.; Shypkova, I.G.; Mamon, V.V.; Devizenko, A.Yu.; Kondratenko, V.V.; Reshetnyak, M.V.; Zubarev, E.N. (Вопросы атомной науки и техники, 2018)
    WC/Si multilayer X-ray mirrors (MXMs) with nominal layers thicknesses of 0.2…30.3 nm (periods: 0.7…38.9 nm) were deposited by direct current magnetron sputtering and studied by X-ray diffraction and cross-sectional ...
  • Initial stages of diffusion and phase formation in Sc/Si layered systems 
    Voronov, D.L.; Zubarev, E.N.; Kondratenko, V.V.; Pershun, Yu.P.; Sevryukova, V.A.; Bugayev, Ye.A. (Functional Materials, 2008)
    Kinetics of phase formation Sc/Si multilayers and Si/Sc/Si three-layers within the temperature range of 130-400°C has been studied by cross-sectional transmission electron microscopy and small-angle X-ray reflectometry. ...
  • Nanoscale Co/C multilayers for "carbon window" Schwarzchild objective 
    Bugayev, Ye.A.; Devizenko, A.Yu.; Zubarev, E.N.; Kondratenko, V.V. (Functional Materials, 2007)
    The formation features of the Co/C multilayer with ≈2.3 nm period have been studied with aim to form a Schwarzschild objective on a "carbon window" for medical and biological investigations. A sequence of multilayer ...
  • Stability of thin quasi-crystalline Ti-Zr-Ni films and related crystalline phases under low-energy transient plasma irradiation 
    Malykhin, S.V.; Kondratenko, V.V.; Makhlai, V.A.; Garkusha, I.E.; Kopylets, I.A.; Borisov, Yu.S.; Herashchenko, S.S.; Surovitskiy, S.V.; Borisova, S.S. (Problems of Atomic Science and Technology, 2022)
    The properties of Ti41Zr38.3Ni20.7 thin films under radiation-thermal action of hydrogen plasma with a surface heat load of 0.2 MJ/m² was studied at the QSPA Kh-50 quasi-stationary plasma accelerator (NSC KIPT). The phase ...
  • Structural-phase changes in thin films and surface layers of Ti41.5Zr41.5Ni17 alloy, stimulated by radiation-thermal impact of hydrogen plasma 
    Malykhin, S.V.; Makhlai, V.A.; Surovitskiy, S.V.; Borisova, S.S.; Herashchenko, S.S.; Kondratenko, V.V.; Kopylets, I.A.; Baturin, A.A.; Terentyev, D. (Вопросы атомной науки и техники, 2019)
    X-ray diffraction and SEM microscopy were used to study structural and phase changes in the surface layers of a Ti41.5Zr41.5Ni17 alloy bulk sample (target) and a thin film (deposited by magnetron sputtering of the target) ...
  • Structural-phase transformations in magnetron deposited films of Ti-Zr-Ni systems during annealing in vacuum 
    Malykhin, S.V.; Kondratenko, V.V.; Kopylets, I.A.; Bogdanov, Yu.S.; Surovitsky, S.V.; Borisova, S.S.; Shipkova, I.G. (Вопросы атомной науки и техники, 2022)
    Structural and phase changes in thin films obtained by magnetron sputtering of a target with the composition Ti41Zr38.3Ni20.7 (at.%) were studied under isothermal vacuum annealing in the temperature range from 400 to 800 ...
  • Structural transformation in C/Si multilayer after annealing 
    Zhuravel, I.O.; Bugayev, Ye.A.; Konotopsky, L.E.; Zubarev, E.M.; Sevryukova, V.A.; Kondratenko, V.V. (Физическая инженерия поверхности, 2012)
    Amorphous C/Si multilayers were prepared by DC magnetron sputtering technique and investigated by transmission electron microscopy and low-angle x-ray diffraction methods after annealing at 650 and 950 °C. The amorphous ...
  • Structural transformation in Zr/Mg multilayer on Si substrate after annealing 
    Konotopsky, L.E.; Kopilets, I.A.; Kosmachev, S.M.; Kondratenko, V.V. (Вопросы атомной науки и техники, 2018)
    A Zr/Mg periodic multilayer was deposited onto silicon substrate by DC magnetron sputtering. Study of the Zr/Mg multilayer structure in an initial state and after thermal annealing in a temperature range of 100...600 °C ...
  • Structural transformation in Zr/Mg multilayer on Si substrate after annealing 
    Konotopsky, L.E.; Kopilets, I.A.; Kosmachev, S.M.; Kondratenko, V.V. (Вопросы атомной науки и техники, 2017)
    A Zr/Mg periodic multilayer was deposited onto silicon substrate by DC magnetron sputtering. Study of the Zr/Mg multilayer structure in an initial state and after thermal annealing in a temperature range of 100...600 °C ...
  • Structure and mechanical stresses in TaSi₂/Si multilayer 
    Devizenko, A.Yu.; Kopylets, I.A.; Kondratenko, V.V.; Pershyn, Y.P.; Devizenko, I.Y.; Zubarev, E.N.; Savitskiy, B.A. (Functional Materials, 2018)
    The structure, construction and mechanical stresses of the TaSi₂/Si multilayer manufactured by magnetron sputtering on the heated substrates were studied in the initial state and after thermal annealing. Deposition of ...